TY - JOUR
T1 - Organic solvent resistant poly(ether-ether-ketone) nanofiltration membranes
AU - Burgal, João da Silva
AU - Peeva, Ludmila G.
AU - Kumbharkar, Santosh
AU - Livingston, Andrew
N1 - Funding Information:
This work was funded by the Novartis Pharma AG, Massachusetts Institute of Technology , United States, sub-award agreement No5710002924 .
Publisher Copyright:
© 2015 Elsevier B.V.
Copyright:
Copyright 2015 Elsevier B.V., All rights reserved.
PY - 2015/4/1
Y1 - 2015/4/1
N2 - In this work a poly(ether ether ketone) (PEEK) membrane is presented for its suitability for organic solvent nanofiltration (OSN) applications using polar aprotic solvents, such as DMF and THF, high temperatures, and basic/acidic conditions. Four grades of PEEK polymer were tested and it was verified that different grades produced membranes with different performances; the post-phase inversion drying process of membrane fabrication was shown to be crucial in obtaining separation performance in the nanofiltration range. The degree of sulphonation (DS) was also important and was controlled to be in the range of 3.7-6.7wt%. The tightest membrane, produced from VESTAKEEP® 4000P and obtained after drying at 20°C from water, presented a permeance of 0.22Lh-1m-2bar-1 and molecular weight cut-off (MWCO) of 400gmol-1 in THF, and a permeance of 0.07Lh-1m-2bar-1 and a MWCO of around 470gmol-1 in DMF.To the best of our knowledge this is the first report on a non-sulphonated and non-modified PEEK membrane capable of separations in the nanofiltration range and resistant to DMF and THF and to basic and acidic aqueous solutions.
AB - In this work a poly(ether ether ketone) (PEEK) membrane is presented for its suitability for organic solvent nanofiltration (OSN) applications using polar aprotic solvents, such as DMF and THF, high temperatures, and basic/acidic conditions. Four grades of PEEK polymer were tested and it was verified that different grades produced membranes with different performances; the post-phase inversion drying process of membrane fabrication was shown to be crucial in obtaining separation performance in the nanofiltration range. The degree of sulphonation (DS) was also important and was controlled to be in the range of 3.7-6.7wt%. The tightest membrane, produced from VESTAKEEP® 4000P and obtained after drying at 20°C from water, presented a permeance of 0.22Lh-1m-2bar-1 and molecular weight cut-off (MWCO) of 400gmol-1 in THF, and a permeance of 0.07Lh-1m-2bar-1 and a MWCO of around 470gmol-1 in DMF.To the best of our knowledge this is the first report on a non-sulphonated and non-modified PEEK membrane capable of separations in the nanofiltration range and resistant to DMF and THF and to basic and acidic aqueous solutions.
KW - Chemical resistance
KW - Degree of sulphonation (DS)
KW - Organic solvent nanofiltration (OSN)
KW - Poly(ether ether ketone) (PEEK)
UR - http://www.scopus.com/inward/record.url?scp=84922569201&partnerID=8YFLogxK
U2 - 10.1016/j.memsci.2014.12.035
DO - 10.1016/j.memsci.2014.12.035
M3 - Article
AN - SCOPUS:84922569201
SN - 0376-7388
VL - 479
SP - 105
EP - 116
JO - Journal of Membrane Science
JF - Journal of Membrane Science
ER -